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|a 0125330189
|c 6970
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| 040 |
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|a DLC
|c MUT
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| 050 |
|
4 |
|a QC176.A1
|b P434
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| 245 |
1 |
0 |
|a Plasma sources for thin film deposition and etching
|b /
|c edited by Maurice H. Francombe, John L. Vossen
|
| 260 |
|
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|a San Diego, CA. :
|b Academic Press,
|c 2008
|
| 300 |
|
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|a xii, 328 p. :
|b illus. ;
|c 23 cm.
|
| 440 |
|
0 |
|a Physics of thin films
|
| 504 |
|
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|a Includes bibliographical references and index.
|
| 650 |
|
0 |
|a Thin films.
|
| 700 |
1 |
|
|a Francombe, Maurice H.
|
| 700 |
1 |
|
|a Vossen, John L.
|
| 991 |
|
|
|a MONOGRAPHS
|b 9
|c 2018-11-06 17:17:23
|d 2021-12-06 10:32:30
|e mut
|f n
|g null
|h n
|i a
|j m
|k
|l a
|m
|n a
|o
|p b
|q
|r cau
|s eng
|t 2008
|v Plasma sources for thin film deposition and etching /
|
