Chemical vapor deposition : thermal and plasma deposition of electronic materials / S. Sivaram
| Main Author: | Sivaram, S. |
|---|---|
| Format: | MONOGRAPHS |
| Language: | English |
| Published: |
New York : Van Nostrand Reinhold, 1995 |
| Subjects: |
Chemical vapor deposition.
Microelectronics -- > Materials. Microelectronics industry. Systems engineering. Computer engineering. Engineering. |
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| 020 | |a 0442010796 |c 782 | ||
| 040 | |a DLC |c MUT | ||
| 050 | 4 | |a TK7836 |b S54C35 | |
| 100 | 1 | |a Sivaram, S. | |
| 245 | 1 | 0 | |a Chemical vapor deposition : thermal and plasma deposition of electronic materials |b / |c S. Sivaram |
| 260 | |a New York : |b Van Nostrand Reinhold, |c 1995 | ||
| 300 | |a xii, 292 p. : |b illus. ; |c 23 cm. | ||
| 504 | |a Includes bibliographical references and index. | ||
| 650 | 0 | |a Chemical vapor deposition. | |
| 650 | 0 | |a Microelectronics -- |x Materials. | |
| 650 | 0 | |a Microelectronics industry. | |
| 650 | 0 | |a Systems engineering. | |
| 650 | 0 | |a Computer engineering. | |
| 650 | 0 | |a Engineering. | |
| 991 | |a MONOGRAPHS |b 6 |c 2018-11-07 05:46:58 |d 2022-06-28 15:42:49 |e mut |f n |g null |h n |i a |j m |k |l a |m |n a |o |p b |q |r nyu |s eng |t 1995 |v Chemical vapor deposition : thermal and plasma deposition of electronic materials / | ||