Principles of plasma discharges and materials processing / Michael A. Lieberman, Allan J. Lichtenberg
| Main Author: | Lieberman, Michael A. |
|---|---|
| Other Authors: | Lichtenberg, Allan J. |
| Format: | MONOGRAPHS |
| Language: | English |
| Published: |
Hoboken, NJ. : John Wiley & Sons, 2005 |
| Edition: | 2nd ed. |
| Subjects: |
Plasma chemistry --
> Industrial applications.
Plasma dynamics. Plasma etching. Thin films -- > Surfaces. |
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| 020 | |a 0471720010 |c 399 | ||
| 040 | |a DLC |c MUT | ||
| 050 | 0 | 0 | |a QC718.5.D9 |b L54P75 2005 |
| 100 | 1 | |a Lieberman, Michael A. | |
| 245 | 1 | 0 | |a Principles of plasma discharges and materials processing |b / |c Michael A. Lieberman, Allan J. Lichtenberg |
| 250 | |a 2nd ed. | ||
| 260 | |a Hoboken, NJ. : |b John Wiley & Sons, |c 2005 | ||
| 300 | |a xxxv, 757 p. : |b illus. ; |c 24 cm. | ||
| 504 | |a Includes bibliographical references and index. | ||
| 650 | 0 | |a Plasma chemistry -- |x Industrial applications. | |
| 650 | 0 | |a Plasma dynamics. | |
| 650 | 0 | |a Plasma etching. | |
| 650 | 0 | |a Thin films -- |x Surfaces. | |
| 700 | 1 | |a Lichtenberg, Allan J. | |
| 991 | |a MONOGRAPHS |b 8 |c 2018-11-06 22:14:03 |d 2022-10-18 16:07:30 |e mut |f n |g 2018-11-06 |h n |i a |j m |k |l a |m |n a |o |p b |q |r nju |s eng |t 2005 |u 2nd ed. |v Principles of plasma discharges and materials processing / | ||